Design for manufacturability through design-process integration (28 February-2 March 2007, San Jose, California, USA)Wong, Alfred Kwok-Kit; Singh, Vivek K.Proceedings of SPIE, the International Society for Optical Engineering. 2007, issn 0277-786X, isbn 978-0-8194-6640-2, 1 v. (various pagings), isbn 978-0-8194-6640-2Conference Proceedings

Model-based assist feature generationYENIKAYA, Bayram; SEZGINER, Apo.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652102.1-652102.8, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Model-assisted routing for improved lithography robustnessKONG, Tim; LEUNG, Hardy; RAGHAVAN, Vivek et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210D.1-65210D.5, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

OPC to reduce variability of transistor propertiesKOIKE, Kaoru; NAKAYAMA, Kohichi; OGAWA, Kazuhisa et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210J.1-65210J.9, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Prediction of interconnect delay variations using pattern matchingCHIN, Eric Y; HOLWILL, Juliet A; NEUREUTHER, Andrew R et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210I.1-65210I.6, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Automatic OPC mask shape repairWORD, James; DUDAU, Draeos; COBB, Nick et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211G.1-65211G.8, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Intelligent visualization of lithography violationsZIGER, David.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211E.1-65211E.10, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Scanner-characteristics-aware OPC modeling and correctionTYMINSKI, Jacek K; QIAOLIN ZHANG; LUCAS, Kevin et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210Z.1-65210Z.13, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

OPC and design verification for DFM using die-to-database inspectionKIM, Jungchan; YANG, Hyunjo; SONG, Jookyoung et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652117.1-652117.10, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Wire sizing and spacing for lithographic printability optimizationKE CAO; JIANG HU; MOSONG CHENG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652111.1-652111.9, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Pattern decomposition for double patterning from photomask viewpointTOYAMA, Nobuhito; ADACHI, Takashi; INAZUKI, Yuichi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210V.1-65210V.10, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Scanner parameter sensitivity analysis for OPEMATSUYAMA, Tomoyuki; NAKASHIMA, Toshiharu; FUJIWARA, Tomoharu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652116.1-652116.8, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Application of enhanced dynamic fragmentation to minimize false error from post OPC verificationKANG, Jae-Hyun; SANG UK LEE; KIM, Jeahee et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210U.1-65210U.8, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Collaborative platform, tool-kit, and physical models for DfMNEUREUTHER, Andy; POPPE, Wojtek; CHOI, Jihong et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652104.1-652104.9, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Cost-performance tradeoff between design and manufacturing : DfM or MfD ?BALASINSKI, A; CETIN, J; KARKLIN, L et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210L.1-65210L.7, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Double patterning design split implementation and validation for the 32nm nodeDRAPEAU, Martin; WIAUX, Vincent; HENDRICKX, Eric et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652109.1-652109.15, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Feedback flow to improve model based OPC calibration test patternTAWFIC, Walid A; AL-IMAM, Mohamed; MADKOUR, Karim et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211J.1-65211J.9, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Hardware verification of litho-friendly design (LfD) methodologiesMÄRZ, Reinhard; PETER, Kai; GRÖNDAHL, Sonja et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210M.1-65210M.9, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Lithography simulation in DfM : achievable accuracy versus requirementsMANSFIELD, Scott; GRAUR, Ioana; HAN, Geng et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652106.1-652106.11, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

SOFT : Smooth OPC fixing technique for ECO processHONGBO ZHANG; ZHENG SHI.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211H.1-65211H.9, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Circuit-based SEM contour OPC model calibrationPATTERSON, Kyle; VASEK, Jim; CHI MIN YUAN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65211N.1-65211N.8, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Coupling-aware mixed dummy metal insertion for lithographyLIANG DENG; WONG, Martin D. F; CHAO, Kai-Yuan et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210H.1-65210H.9, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

DRC plus : Augmenting standard DRC with pattern matching on 2D geometriesDAI, Vito; JIE YANG; RODRIGUEZ, Norma et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210A.1-65210A.12, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Improving the power-performance of multicore processors through optimization of lithography and thermal processingGABOR, A. H; BRUNNER, T; LE, N et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 65210K.1-65210K.7, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper

Self assembled dummy patterns for lithography process margin enhancementMOON, James; NAM, Byoung-Sub; JEONG, Joo-Hong et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 652118.1-652118.7, issn 0277-786X, isbn 978-0-8194-6640-2Conference Paper